Electron Beam Writing

Advanced microelectronics, photonics, nanotechnology – they all rely on high resolution e-beam lithography
as the primary source for ultra-fine lateral patterns, generated directly on the substrate.

E-beam lithography as a computer-controlled sequential writing process transfers designs from
CAD layout description to physical object.

E-beam writing uniquely combines ultra-high resolution, overlay performance and direct, computer driven pattern generation.

We are the first independent direct wafer write e-beam service.

Read more about   the main advantages of direct e-beam writing