Direct Write on Si, GaAs,
 InP, SiC, GaN, Diamond
 > High Frequency
 Electronics
 > Photonics
 Pattern Design
 Ultrahigh Resolution
 Patterning & Nanotechnology
 Application Studies &
 Research
 Consulting & Evaluation




High Frequency Electronics
High-frequency electronics has been the major driver and first production-relevant application for direct write e-beam lithography. Gatelengths in the 100 nm range can be produced with good process latitude and yield. Relying on e-beam technology, GaAs and InP FETs deliver power gain cutoff frequencies well above 100 GHz and are the crucial building blocks of advanced microwave monolithic integrated circuits (MMICs).




During the last ten years, we have exposed thousands of III/V-wafers (2-4 inch) with more than 100 different designs for MMICs and discretes.




We have fabricated T- and G-Gates on GaAs and InP with gatelengths in the sub-100 nm regime.