Speciality Masks
 > Quantum II
 > Quantum II Versions
 > Quantum II AFM Evaluation
 Masters for Nano Imprint
 Lithography
 Reference Standards for
 Nano-Metrology
 Monte Carlo Simulation
 Software




Quantum II AFM Evaluation
Atomic Force Microscopy (AFM) is utilized to investigate Chrome on Quartz pattern fidelity. The following examples represent results obtained for the wiring background pattern and design scaling factors of 0.14 and 0.10. All figures shown are based on raw scan data as obtained from the Force Microscope (Digital Instruments NanoScope). No attempts have been made to compensate for the actual AFM tip geometry.

Example 1

Defect Category: Bridge
Scaling Factor: 0.14
Instance: DEFWARRAY A 10 56

   
Programmed bridge defect in 420nm wiring background pattern. Nominal bridge width: 140nm, measured width: 117nm. Noticeable pattern skew in second figure is due to thermal drift of the AFM instrument.


Example 2

Defect Category: Gap
Scaling Factor: 0.14
Instance: DEFWARRAY A 05 54

   

Programmed gap defect in 420nm wiring background pattern. Nominal gap width: 70nm, measured width: 54nm.


Example 3

Defect Category: Bridge
Scaling Factor: 0.10
Instance: DEFWARRAY A 10 56

   

Programmed bridge defect in 300nm wiring background pattern. Nominal bridge width: 100nm, measured width: 109nm.



Additional pattern independent AFM results
Corner acuity: estimated Chrome corner radius: < 25nm
Measured Chrome surface roughness: 0.82nm RMS
Measured Quartz surface roughness: 0.30nm RMS