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Quantum II
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Ultra High Resolution Test Mask for
Benchmarking of Advanced Defect Inspection Systems
Defect Printability Studies
Quantum II masks render programmed defect
geometries in the sub-100nm regime.
Pattern design is based on the SEMI (Standard P23-93)
description "Guideline for Programmed Defect Masks and
Benchmark Procedures for Sensitivity Analysis of Mask
Defect Inspection Systems". The SEMI specification defines a
set of defect categories (e.g. dot, protrusion, bridge, etc.)
rendered in a quasi-device background context of contact
holes and wiring patterns. The design has a fundamental
background pattern geometry of 3um and a programmed
defect range of 100nm ... 1200nm (in 100nm increments).
Therefore, the original SEMI design has to be scaled down in
order to reach geometry levels that reflect current and future
lithographic requirements.
Quantum II plates are manufactured using our proprietary
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