More than 15 years extreme lithography!

Xlith, founded in 1997 by Dr. Bernd E. Maile, is built on more than 30 years of his experience in 
ultra-high resolution e-beam lithography, with applications in microelectronics, nanotechnology and photonics.

We are relying on an excellent e-beam tool-set.
Xlith staff has developed proprietary hardware add-ons and software modules for utmost system performance and reliability.

Contributing to the development of state-of-the-art e-beam tools and process technology, xlith today is
world-wide leading in ultrafine-patterning to the point of lateral dimensions down to 10 nm.

We will never stop to push technology further - for the highest level of resolution, accuracy and throughput.