10 years extreme lithography – let’s face the next decade!
Founded in 1997 by Dr. Bernd Maile, xlith is built on more than 25 years of experience
in ultra-high resolution e-beam lithography, with applications in microelectronics, nanotechnology
and photonics.
We are relying on an excellent e-beam tool-set. Xlith staff has developed proprietary hardware add-ons
and software modules for utmost system performance and reliability.
Contributing to the development of state-of-the-art e-beam tools and process technology, xlith today is
world-wide leading in ultrafine-patterning to the point of lateral dimensions down to 10 nm.
We will never stop to push technology further - for the highest level of resolution, accuracy and throughput.
So, let’s face the next decade!
