About xlith

Founded in 1997 by Dr. Bernd E. Maile, Xlith is built on more than
30 years of his experience in ultra-high resolution e-beam lithography, with applications in microelectronics, nanotechnology and photonics.

We offer services and products related to pattern generation
in the 10 nm - 250 nm regime.

Xlith has served the most demanding customers in industry and academia.

  To achieve outstanding results we combine:
  • State-of-the-art electron beam equipment, additionally fine-tuned
    for optimum performance
  • Thorough theoretical understanding
  • In-house developed simulation and correction tools
  • Proprietary process technologies

 

We know how to write nanometer