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Founded 1997 by Dr. Bernd Maile, xlith is built on more than
25 years of experience in ultrahigh resolution electron beam
lithography.
We offer services and products related to pattern generation
in the 10 nm - 250 nm regime.
Xlith has served the most demanding customers in industry and academia.
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To achieve outstanding results we combine:
- State-of-the-art electron beam equipment, additionally fine-tuned
for optimum performance
- Thorough theoretical understanding
- In-house developed simulation and correction tools
- Proprietary process technologies
We know how to write nanometer.
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